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Investigation of silicon nitride for spacer via plasma-enhanced atomic layer deposition using a (tert-butylamino)dimethylsilane precursorGo to Link

Park, Chae-Yeon; Yang, Hae Lin; Kim, Hye-Mi; Kim, Daejung; Park, Yongjoo; Park, Jongruyl; Shin, Seokhee; Park, Jin-Seong

ArticleIssue Date2024CitationApplied Surface Science, v.670, pp 1 - 10PublisherElsevier BV
SCIESCOPUS
Material and Electrical Characteristics of a Thin-Film Transistor Using Cationic Composition-Controlled Atomic Layer-Deposited In–Ga–Sn–O (IGTO) Thin FilmGo to Link

Lee, Chanseul; Kim, Sunbum; Min, Kyoung Yeon; Kim, Gyulee; Kim, Minhyuk; Park, Yongjoo; Choi, Changhwan

ArticleIssue Date2026CitationACS Applied Electronic Materials, v.8, no.3, pp 1080 - 1087PublisherAmerican Chemical Society
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