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SCIESCOPUS
A method for measuring individual ion density in an Ar/He mixture inductively coupled plasmaGo to Link

Son, Jin-Ung; Lee, Moo-Hyun; Kim, Min-Seok; Jung, Jiwon; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.3, pp 1 - 10PublisherInstitute of Physics Publishing
SCIESCOPUS
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature PlasmaGo to Link

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Lim, Chang-Min; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2025CitationACS Applied Electronic Materials, v.7, no.10, pp 4520 - 4528PublisherAmerican Chemical Society
SCIESCOPUS
Control of axial direction electron temperature distribution by gradient DC magnetic field in inductively coupled plasmaGo to Link

Jiang, Yi-Lang; He, You; Seo, Beom-Jun; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.3, pp 1 - 12PublisherInstitute of Physics Publishing
SCIESCOPUS
Control of the photoresist etch uniformity in inductive discharge with magnetic resonance wireless power transferGo to Link

Park, Junyoung; Hong, Young-Hun; Kang, Gil-Ho; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.2, pp 1 - 13PublisherInstitute of Physics Publishing
SCIESCOPUS
Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasmaGo to Link

He, You; Jiang, Yi-Lang; Lee, Myoung-Jae; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A, v.42, no.6, pp 1 - 12PublisherAmerican Institute of Physics
SCIESCOPUS
Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasmaGo to Link

He, You; Jiang, Yi-Lang; Lee, Myoung-Jae; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationJournal of Vacuum Science and Technology A, v.42, no.6, pp 1 - 13PublisherAmerican Institute of Physics
SCIESCOPUS
Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 PlasmaGo to Linkopen access

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2026CitationAdvanced Materials Interfaces, v.13, no.1, pp 1 - 9PublisherWILEY
SCIE
Transparent electrical-optical probe for noninvasive plasma diagnosticsGo to Link

Seo, Beom-Jun; Kim, Kyung-Hyun; Ahn, Se-hun; Kim, Deok-Hwan; Jung, Un Jae; Chung, Chin-Wook

ArticleIssue Date2026CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.35, no.3, pp 1 - 21PublisherIOP Publishing Ltd
SCIESCOPUS
Triple-frequency floating probe method for plasma parameters applicable to processing plasmasGo to Link

Seo, Beom-Jun; Lee, Ho-Won; Jeon, Sang-Bum; Nahm, Hyeon-Ho; Chung, Chin-Wook

ArticleIssue Date2025CitationPlasma Sources Science and Technology, v.34, no.5, pp 1 - 10PublisherInstitute of Physics Publishing
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