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Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( (i) Pr-DAD)(2)Go to Link

Kim, Jinho; Jang, Woochool; Park, Jingyu; Jeon, Heeyoung; Kim, Hyunjung; Yuh, Junhan; Jeon, Hyeongtag

ArticleIssue Date2015CitationJournal of the Korean Physical Society, v.66, no.5, pp 821 - 827Publisher한국물리학회

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Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (Cp-Me)W(CO)(2)(NO) for Cu diffusion barrier Go to Link

Kim, Hyunjung; Park, Jingyu; Jeon, Heeyoung; Jang, Woochool; Jeon, Hyeongtag; Yuh, Junhan

ArticleIssue Date2015CitationJournal of Vacuum Science and Technology A, v.33, no.5, pp 1 - 6PublisherAmerican Institute of Physics

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Effect of a Ti capping layer on thermal stability of NiSi formed from Ni thin films deposited by metal organic chemical vapor deposition using a Ni(Pr-i-DAD)(2) precursor Go to Link

Park, Jingyu; Jeon, Heeyoung; Kim, Hyunjung; Jang, Woochool; Kang, Chunho; Yuh, Junhan; Jeon, Hyeongtag

ArticleIssue Date2015CitationJapanese Journal of Applied Physics, v.54, no.2, pp 1 - 7PublisherIOP Publishing Ltd

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Improvement of thermal stability of nickel silicide film using NH3 plasma treatment Go to Link

Park, Jingyu; Jeon, Heeyoung; Kim, Hyunjung; Jang, Woochool; Kim, Jinho; Kang, Chunho; Yuh, Junhan; Jeon, Hyeongtag

ArticleIssue Date2014CitationJapanese Journal of Applied Physics, v.53, no.9, pp 1 - 6PublisherIOP Publishing Ltd

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SnO2 encapsulated TiO2 hollow nanofibers as anode material for lithium ion batteries Go to Link

Park, Hyunjung; Song, Taeseup; Han, Hyungkyu; Devadoss, Anitha; Yuh, Junhan; Choi, Changhwan; Paik, Ungyu

ArticleIssue Date2012CitationElectrochemistry Communications, v.22, pp 81 - 84PublisherElsevier BV

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Synthesis of Li2MnSiO4-Graphene Composite and Its Electrochemical Performances as a Cathode Material for Lithium Ion Batteries Go to Link

Kim, Jeonghyun; Song, Taeseup; Park, Hyunjung; Yuh, Junhan; Paik, Ungyu

ArticleIssue Date2014CitationJournal of Nanoscience and Nanotechnology, v.14, no.10, pp 7898 - 7902PublisherAmerican Scientific Publishers

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The annealing effect on work function variation of WNxCy films deposited by remote plasma atomic layer deposition Go to Link

Kim, Hyunjung; Jang, Woochool; Shin, Changhee; Lee, Kunyoung; Lim, Heewoo; Kim, Manseok; Yuh, Junhan; Jeon, Hyeongtag

ArticleIssue Date2017Citationphysica status solidi (a) - applications and materials science, v.214, no.7PublisherWiley - V C H Verlag GmbbH & Co.

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Browsing by Yuh, JunhanAuthor

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