Self-stopping slurry for planarizing extremely high surface film topography in nanoscale semiconductor devices
- Authors
- Son, Young-Hye; Park, Jea-Gun; Choo, Byoung-Kwon; Kang, Seung-bae
- Issue Date
- Jul-2021
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Chemical-mechanical planarization (CMP); CMP slurry; Self-stopping; Ceria; Polyvinylpyrrolidone
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.79, no.1, pp.44 - 48
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 79
- Number
- 1
- Start Page
- 44
- End Page
- 48
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/1009
- DOI
- 10.1007/s40042-021-00207-x
- ISSN
- 0374-4884
- Abstract
- In this study, a novel chemical-mechanical planarization (CMP) slurry that can perform self-stop polishing was designed. The essential aspects for self-stop polishing are precise design of a nonionic polymer type, molecular weight, and molecular concentration of a self-stopping chemical agent. A good example is polyvinylpyrrolidone (PVP) with a molecular weight of 1300 k and molecular concentration of 0.3 wt%. In this chemical design, the adsorption of a polymer hindrance layer on the surface film topography during CMP can become sufficient under self-stop conditions such as a specific polishing time (e.g., 4 min). The self-stop polishing mechanism is associated with the presence of a relative local pressure difference on the surface film topography. The proper adsorption of the polymer hindrance layer on the surface topography can achieve a uniform relative local pressure distribution globally, and the film polishing rate can achieve adequate planarization of the surface film topography.
- Files in This Item
-
Go to Link
- Appears in
Collections - 서울 공과대학 > 서울 융합전자공학부 > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/1009)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.