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The Effects of Different ALD Oxidants on the Synaptic Characteristics of HfO2 Conductive Bridge Random Access Memory
- Authors
- 최창환
- Issue Date
- 14-Nov-2021
- Publisher
- The Japan Society of Applied Physcis
- Citation
- nternational Workshop on Dielectric Thin Films for Future Electron Devices - Science and Technology - (IWDTF)
- Conference Name
- nternational Workshop on Dielectric Thin Films for Future Electron Devices - Science and Technology - (IWDTF)
- Place
- On-line Virtual
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)