Stretchable Polymer Gate Dielectric by Ultraviolet-Assisted Hafnium Oxide Doping at Low Temperature for High-Performance Indium Gallium Tin Oxide Transistors
- Authors
- Hur, Jae Seok; Kim, Jeong Oh; Kim, Hyeon A.; Jeong, Jae Kyeong
- Issue Date
- Jun-2019
- Publisher
- AMER CHEMICAL SOC
- Keywords
- low temperature; ultraviolet (UV); stretchability; hybrid dielectric; thin-film transistor (TFT); indium gallium tin oxide (IGTO)
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.11, no.24, pp.21675 - 21685
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 11
- Number
- 24
- Start Page
- 21675
- End Page
- 21685
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/13474
- DOI
- 10.1021/acsami.9b02935
- ISSN
- 1944-8244
- Abstract
- This paper reports the fabrication of indium gallium tin oxide (IGTO) thin-film transistors (TFTs) with ultraviolet (UV)-treated PVP-co-PMMA-based hybrid gate insulators at an extremely low temperature (<= 150 degrees C). Synergetic hafnia loading and UV treatment were used to tailor the mechanical softness and hydroxyl fraction in the polymer dielectric film. The UV-treated hybrid dielectric film had a low hydroxyl concentration, a smoother surface, and a denser packing nature, which can be explained by the high ionicity of hafnium oxide and photon-assisted improvement in the cohesion between organic and inorganic materials. Suitability of the UV-treated hybrid dielectric film as a gate insulator was evaluated by fabricating bottom gate TFTs with sputtered IGTO films as a channel layer, which showed high carrier mobility at a low temperature. The resulting IGTO TFTs with a UV-treated hybrid gate insulator exhibited a remarkable high field-effect mobility of 25.9 cm(2)/(V s), a threshold voltage of -0.2 V, a subthreshold gate swing of 0.4 V/decade, and an I-ON/OFF ratio of >10(7) even at a low annealing temperature of 150 degrees C. The fabricated IGTO TFTs with the UV -treated hybrid dielectric film on the plastic substrate were shown to withstand the 100 times mechanical bending stress even under an extremely small curvature radius of 1 mm due to the intrinsic stretchability of the hybrid dielectric film.
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