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Improved Performance of ITZO TFT with Stacked High-k ZrO2/SiO2 Gate Insulator in Nanoscale by Plasma Enhanced Atomic Layer Deposition
- Authors
- 박진성
- Issue Date
- 28-Jan-2021
- Publisher
- 한국반도체연구조합
- Citation
- 제 28회 한국반도체 학술대회
- Conference Name
- 제 28회 한국반도체 학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)