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Cited 2 time in webofscience Cited 2 time in scopus
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Characteristics of band modulation FET on sub 10 nm SOI

Authors
Kwon, SehyunNavarro, CarlosGamiz, FranciscoCristoloveanu, SorinGaly, PhileppeChoi, MinhoKim, Yong TaeAhn, Jinho
Issue Date
Apr-2019
Publisher
IOP Publishing Ltd
Citation
Japanese Journal of Applied Physics, v.58, no.B, pp 1 - 7
Pages
7
Indexed
SCI
SCIE
SCOPUS
Journal Title
Japanese Journal of Applied Physics
Volume
58
Number
B
Start Page
1
End Page
7
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/14255
DOI
10.7567/1347-4065/aafc9f
ISSN
0021-4922
1347-4065
Abstract
The electrical characteristics of band modulation FET are investigated with energy band diagrams between drain to source through intrinsic gate region according to front/back gates and drain bias conditions. The drain current-voltage and transfer characteristics show extremely steep slope with minimum subthreshold swing of 1.6 mV/decade. Memory window is 0.27 V, which is determined with turn on voltages at "0" and "1" states through multiple cycles of write and read operations. Memory performance also shows that current margin to distinguish the "0" and "1" state has the maximum value of over 100 mu A at V-D of 1.2 V. But, the current margin is relatively less affected by the front and back gate bias under the conditions that V-D is applied in the memory window range and the current at "0" state remains low.
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