Correlative analysis of conducting filament distribution at interfaces and bias-dependent noise sources in TiN/TiOx/Pt and Pt/TiOx/TiOy/Pt bipolar resistive switching frames

Abstract

We evaluated conducting filament distributions occurring at interfaces of TiN/TiOx/Pt and Pt/TiOx/TiOy/Pt bipolar resistive switching elements after electroforming by identifying bias-dependent low-frequency noise sources. The TiN/TiOx/Pt switching element showed higher noise features at low and high resistance states (LRS and HRS) than the Pt/TiOx/TiOy/P-t one. These behaviors are predominantly associated with the presence of different resistance distributions at LRS and HRS observed in both switching I-V curves. We propose a possible mechanism to explain the unique observed features by employing the role of the oxygen reservoir and conducting filament stability at interfaces of the two switching elements.