Control of electron energy distribution by adding a pulse inductive field in capacitive discharge
- Authors
- Lee, Hyo-Chang; Chung, Chin-Wook
- Issue Date
- Dec-2014
- Publisher
- IOP PUBLISHING LTD
- Keywords
- electron energy distribution; pulsed plasma; plasma parameter; plasma control
- Citation
- PLASMA SOURCES SCIENCE & TECHNOLOGY, v.23, no.6, pp.1 - 6
- Indexed
- SCIE
SCOPUS
- Journal Title
- PLASMA SOURCES SCIENCE & TECHNOLOGY
- Volume
- 23
- Number
- 6
- Start Page
- 1
- End Page
- 6
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/143935
- DOI
- 10.1088/0963-0252/23/6/062002
- ISSN
- 0963-0252
- Abstract
- Drastic changes in the electron energy distribution (EED) and the plasma parameter caused by a pulse-modulated (PM) inductive field were observed in a low-gas pressure capacitively coupled plasma (CCP). By applying a small amount of the PM inductive power (20 W) in the CCP, the effective electron temperature (T-eff) was increased without a variation of the plasma density (n(e)) due to the low energy electron heating by the inductive field. When a large amount of the PM inductive power of 50 W was applied to the CCP, both the T-eff and the n(e) were increased because of the electron heating through the coupling effect of the inductive and capacitive fields. These results show that T-eff and n(e) can be controlled independently or simultaneously in the plasmas by adding the pulse inductive field.
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