Power dependence of electron density at various pressures in inductively coupled plasmas
- Authors
- Kim, June Young; Kim, Dong-Hwan; Kim, Ju Ho; Jeon, Sang-Bum; Cho, Sung-Won; Chung, Chin-Wook
- Issue Date
- Nov-2014
- Publisher
- AMER INST PHYSICS
- Citation
- PHYSICS OF PLASMAS, v.21, no.11, pp.1 - 5
- Indexed
- SCIE
SCOPUS
- Journal Title
- PHYSICS OF PLASMAS
- Volume
- 21
- Number
- 11
- Start Page
- 1
- End Page
- 5
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/143971
- DOI
- 10.1063/1.4901305
- ISSN
- 1070-664X
- Abstract
- Experimental observation of the electron density variation in inductively coupled plasmas with the electron energy probability function (EEPFs) was performed at various gas pressures at two RF powers (25W and 200 W). The measured EEPFs at high power discharges (200 W) showed a Maxwellian distribution, while evolution of the EEPFs from a bi-Maxwellian distribution to a Druyvesteyn-like distribution was observed at low RF powers (25 W) with increasing pressure. A discrepancy of the electron density variation between the two RF powers was observed. This difference is explained by the modified collisional loss and the Bohm velocity from the EEPF of the bi-Maxwellian distribution and the Druyvesteyn-like distribution.
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