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Cited 15 time in webofscience Cited 14 time in scopus
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Effects of oxygen stoichiometry on resistive switching properties in amorphous tungsten oxide films

Authors
Jang, ByeongukInamdar, A. I.Kim, JongminJung, WoongIm, HyunsikKim, HyungsangHong, Jin Pyo
Issue Date
Jun-2012
Publisher
ELSEVIER SCIENCE SA
Keywords
Tungsten oxide; Sputtering; Resistive switching
Citation
THIN SOLID FILMS, v.520, no.16, pp.5451 - 5454
Indexed
SCIE
SCOPUS
Journal Title
THIN SOLID FILMS
Volume
520
Number
16
Start Page
5451
End Page
5454
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/144767
DOI
10.1016/j.tsf.2012.03.111
ISSN
0040-6090
Abstract
The bipolar resistance switching in WO3+delta films sandwiched by Al and Pt electrodes was investigated by changing additional oxygen content (delta). Reliable switching voltages and retention were observed for all samples. As delta increases the bi-stable current voltage characteristics fluctuate leading to unstable switching power consumption. An analysis of the temperature dependence of the bi-stable resistance states revealed additional features that thermionic emission and metallic conduction co-contribute to the electrical transport of the resistance states. The authors propose that the observed resistance switching is due to the combined effects of potential modification near the interface and the formation of a metallic channel.
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