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A study of encapsulation structure for TFT reliability in top emission OLED display

Authors
Jae Young OhSeungHee NamKwon-Shik ParkSooYoung YoonInByeong KangJae Kyeong Jeong
Issue Date
Nov-2019
Publisher
International Display Workshops
Keywords
Encapsulation; Hydrogen; Multilayer; Oxide
Citation
Proceedings of the International Display Workshops, v.2, pp.910 - 913
Indexed
SCOPUS
Journal Title
Proceedings of the International Display Workshops
Volume
2
Start Page
910
End Page
913
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/146732
DOI
10.36463/idw.2019.0910
ISSN
1883-2490
Abstract
Preventing hydrogen and water vapor from permeating through encapsulation layer plays an important role in TFT Reliability. To improve a blocking characteristic, enca psulation inorganic layers were studied. A multilayered ino rganic deposition method for Organic Light Emitting Displ ay has been developed to obtain a reliable performance. SiNx and SiO2 were used to create a multilayered structur e of the inorganic encapsulation and its blocking ability against hydrogen, water vapor permeation was compared with a single inorganic encapsulation. In conclusion, the inorganic multi-structure of encapsulation has shown an advanced performance in blocking.
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Jeong, Jae Kyeong
COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)
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