Redesigned t-PFF-v device fabricated with one-step anisotropic chemical wet etching process: enhanced separation efficiency for colloidal particles in continuous-mode
- Authors
- Nho, Hyun Woo; Park, Joon Shik; Yoon, Tae Hyun
- Issue Date
- May-2017
- Publisher
- IOP PUBLISHING LTD
- Keywords
- microfluidics; separation; pinched flow fractionation; anisotropic Si chemical etching
- Citation
- JOURNAL OF MICROMECHANICS AND MICROENGINEERING, v.27, no.5
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF MICROMECHANICS AND MICROENGINEERING
- Volume
- 27
- Number
- 5
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/152421
- DOI
- 10.1088/1361-6439/aa6672
- ISSN
- 0960-1317
- Abstract
- A pinched flow fractionation device with trapezoid-shaped pinched segment and cross-flow side channels (t-PFF-v) was redesigned and fabricated with a one-stop anisotropic chemical wet etching process and its enhanced separation capability was demonstrated for spherical polystyrene (PS) particles with diameter ranges of 2-8 mu m. The tilted sidewalls and vertical focusing channels of the t-PFF-v device led to an improved separation resolution (R-m,(n)) via enhanced separation distance of PS particles at the pinched segment (Delta x(m, n)) and reduced effluent particle distribution width (s(n)). Using this t-PFF-v device with W-p (pinched segment width) of 25 mu m, PS particles with diameters of 4, 6, and 8 mu m were simultaneously separated with good separation resolution (R-4,R-6 = 3.2 and R-6,R-8 = 3.4). Moreover, by adapting even smaller pinched segment width (Wp = 15 mu m), PS particles with diameters of 2 and 4 mu m, not well separated in the previous studies, were clearly separated with 9.5-fold improvement in R-2,R-4 compared with the normal PFF device (n-PFF). The effects of inlet flow rate ratio (Q(2)/Q(1)) on the separation efficiency were also carefully investigated and provided additional insight on the separation processes within the pinched segment of t-PFF-v device. The drain flow through the cross-flow v-channels helps better alignment of particles at the sidewall of pinched segment and resulted in significantly reduced distribution of effluent particles, even under the operating conditions with low Q(2)/Q(1) values.
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