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Enhancement of memory windows in Pt/Ta2O5 (-) (x)/Ta bipolar resistive switches via a graphene oxide insertion layer

Authors
Chung, Je BockBae, Yoon CheolLee, Ah RahmBaek, Gwang HoLee, Min YongYoon, Hee WookPark, Ho BumHong, Jin Pyo
Issue Date
Jul-2015
Publisher
ELSEVIER SCIENCE SA
Keywords
Resistive switching; Graphene oxide; Bipolar resistive switches; Resistive random-access memory
Citation
THIN SOLID FILMS, v.587, pp.57 - 60
Indexed
SCIE
SCOPUS
Journal Title
THIN SOLID FILMS
Volume
587
Start Page
57
End Page
60
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/156889
DOI
10.1016/j.tsf.2014.11.032
ISSN
0040-6090
Abstract
The influence of a graphene oxide (GO) layer on Pt/Ta2O5 - x/Ta bipolar resistive switches, in which the GO layer is spin-coated on the Ta bottom electrode before the growth of a Ta2O5-x switching element was examined. Experimental observations suggest that the insertion of the GO layer is crucial for adjusting the low resistance states without changing the high resistance states. Controlling GO layer thickness represents the variation of the forming voltage and on/off ratio, demonstrating enhanced memory windows. The possible nature of the enhanced switching events is described by adapting the creation of strong conductive filaments driven by a greater resistive GO layer.
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서울 자연과학대학 > 서울 물리학과 > 1. Journal Articles
서울 공과대학 > 서울 에너지공학과 > 1. Journal Articles

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