Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy
DC Field | Value | Language |
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dc.contributor.author | Lee, Jae Uk | - |
dc.contributor.author | Hong, Seongchul | - |
dc.contributor.author | Ahn, Jinho | - |
dc.contributor.author | Doh, Jonggul | - |
dc.contributor.author | Jeong, SeeJun | - |
dc.date.accessioned | 2022-07-16T04:54:27Z | - |
dc.date.available | 2022-07-16T04:54:27Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2014-05 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/160043 | - |
dc.description.abstract | The authors evaluated the feasibility of using coherent scattering microscopy (CSM) as an actinic metrology tool by employing it to determine the critical dimension (CD) and normalized image log-slope (NILS) values of contaminated extreme ultraviolet (EUV) masks. CSM was as effective as CD scanning electron microscopy (CD-SEM) in measuring the CD values of clean EUV masks in the case of vertical patterns (nonshadowing effect); however, only the CSM could detect shadowing effect for horizontal patterns resulting in smaller clear mask CD values. Owing to weak interaction between the low-density contaminant layer and EUV radiation, the CSM-based CD measurements were not as affected by contamination as were those made using CD-SEM. Furthermore, CSM could be used to determine the NILS values under illumination conditions corresponding to a high-volume manufacturing tool. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.title | Actinic critical dimension measurement of contaminated extreme ultraviolet mask using coherent scattering microscopy | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ahn, Jinho | - |
dc.identifier.doi | 10.1116/1.4873697 | - |
dc.identifier.scopusid | 2-s2.0-84899564585 | - |
dc.identifier.wosid | 000337061900045 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.32, no.3, pp.1 - 6 | - |
dc.relation.isPartOf | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.citation.volume | 32 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 6 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | PATTERN PRINTABILITY | - |
dc.subject.keywordPlus | HARMONIC-GENERATION | - |
dc.subject.keywordPlus | PHASE RETRIEVAL | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | ABSORBER | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | FLARE | - |
dc.subject.keywordPlus | ANGLE | - |
dc.identifier.url | https://avs.scitation.org/doi/10.1116/1.4873697 | - |
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