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A study on MoS2 etching using ultra-low electron temperature plasma
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스호텔(부산)
Improvement of spatial distribution measurement of plasma parameters through asymmetric double Langmuir probe
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스호텔(부산)
Electron-assisted PR etching in an inductivley coupled oxygen plasma via low-energy electron beam
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스호텔(부산)
Impedance Measurement of SiC Using Multi-Frequency Analysis for Real-Time Control of the Focus Ring in Plasma Processing
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스호텔(부산)
Modeling of electron temperature and electron density in ultra-low electron temperature
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스호텔(부산)
Enhancement of photoresist etching by controlling the impedance between bias electrode and ground in an inductively coupled plasma
정진욱
Conference
Issue Date
2022
Citation
Korean international semiconductor conference on manufacturing technology 2022
Publisher
KISM 2022
Place
파라다이스 호텔(부산)
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2022
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