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Electron-assisted PR etching in an inductivley coupled oxygen plasma via low-energy electron beam
- Authors
- 정진욱
- Issue Date
- 14-Nov-2022
- Publisher
- KISM 2022
- Citation
- Korean international semiconductor conference on manufacturing technology 2022
- Conference Name
- Korean international semiconductor conference on manufacturing technology 2022
- Place
- 파라다이스호텔(부산)
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)