Effects of composition and thickness of TiN metal gate on the equivalent oxide thickness and flat-band voltage in metal oxide semiconductor devices
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Seok-Hee | - |
dc.contributor.author | Choi, Rino | - |
dc.contributor.author | Choi, Changhwan | - |
dc.date.accessioned | 2022-07-16T08:25:55Z | - |
dc.date.available | 2022-07-16T08:25:55Z | - |
dc.date.created | 2021-05-12 | - |
dc.date.issued | 2013-09 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/162015 | - |
dc.description.abstract | We investigated the effects of gas flow rates during sputtering and thickness of TIN metal gate on the equivalent oxide thickness (EOT) and flat band voltage (V-FB) in the gate-first (GF) processed metal oxide semiconductor (MOS) devices with HfO2 and HfSiON-based gate dielectrics. For both HfO2 and HfiSON devices, more metallic TIN causes thinner EOT with lower V-FB while higher V-FB is observed along with thicker EOT for nitrogen-rich TIN case. Also, thicker TiN induces more positive V-FB shift. However, for HfSiON, amount of V-FB shift and EOT reduction is smaller than those of HfO2-based device, resulting from stronger immunity of Hf-Si bonding against oxygen vacancy generation during thermal process. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER | - |
dc.title | Effects of composition and thickness of TiN metal gate on the equivalent oxide thickness and flat-band voltage in metal oxide semiconductor devices | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Choi, Changhwan | - |
dc.identifier.doi | 10.1016/j.mee.2013.03.056 | - |
dc.identifier.scopusid | 2-s2.0-84876882957 | - |
dc.identifier.wosid | 000321229200044 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.109, pp.160 - 162 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 109 | - |
dc.citation.startPage | 160 | - |
dc.citation.endPage | 162 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | Gate dielectrics | - |
dc.subject.keywordPlus | Hafnium oxides | - |
dc.subject.keywordPlus | MOS devices | - |
dc.subject.keywordPlus | Titanium nitride | - |
dc.subject.keywordPlus | CMOS integration | - |
dc.subject.keywordPlus | Equivalent oxide thickness | - |
dc.subject.keywordPlus | Flat-band voltage | - |
dc.subject.keywordPlus | High-k gate dielectrics | - |
dc.subject.keywordPlus | Metal gate | - |
dc.subject.keywordPlus | Metal oxide semiconductor | - |
dc.subject.keywordPlus | Thermal process | - |
dc.subject.keywordPlus | Vacancy generation | - |
dc.subject.keywordAuthor | High-kappa gate dielectric | - |
dc.subject.keywordAuthor | Metal gate | - |
dc.subject.keywordAuthor | Flat-band voltage | - |
dc.subject.keywordAuthor | CMOS integration | - |
dc.identifier.url | https://www.sciencedirect.com/science/article/pii/S0167931713002736?via%3Dihub | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea+82-2-2220-1365
COPYRIGHT © 2021 HANYANG UNIVERSITY.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.