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Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

Authors
Lee, Hee-JinLee, Hyo-ChangKim, Young-CheolChung, Chin-Wook
Issue Date
Jun-2013
Publisher
IOP PUBLISHING LTD
Citation
PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.3, pp.1 - 5
Indexed
SCIE
SCOPUS
Journal Title
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume
22
Number
3
Start Page
1
End Page
5
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/162644
DOI
10.1088/0963-0252/22/3/032002
ISSN
0963-0252
Abstract
With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency omega(r) of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As omega(r) of the outer resonant coil changes from the non-resonant condition (where omega(r) is not the driving angular frequency omega(rf)) to the resonant condition (where omega(r) = omega(rf)), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer.
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COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)
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