Control of plasma density distribution via wireless power transfer in an inductively coupled plasma
- Authors
- Lee, Hee-Jin; Lee, Hyo-Chang; Kim, Young-Cheol; Chung, Chin-Wook
- Issue Date
- Jun-2013
- Publisher
- IOP PUBLISHING LTD
- Citation
- PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.3, pp.1 - 5
- Indexed
- SCIE
SCOPUS
- Journal Title
- PLASMA SOURCES SCIENCE & TECHNOLOGY
- Volume
- 22
- Number
- 3
- Start Page
- 1
- End Page
- 5
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/162644
- DOI
- 10.1088/0963-0252/22/3/032002
- ISSN
- 0963-0252
- Abstract
- With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency omega(r) of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As omega(r) of the outer resonant coil changes from the non-resonant condition (where omega(r) is not the driving angular frequency omega(rf)) to the resonant condition (where omega(r) = omega(rf)), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer.
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