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Hall mobility manipulation in TiO2-x semiconductor films by hydrogen-ion irradiation

Authors
Yeo, C. S.Chung, Kwun-BumSong, JonghanChae, Keun HwaPark, Jin-SeongSong, JunghoonPark, Sang HanCho, Mann-Ho
Issue Date
Mar-2013
Publisher
한국물리학회
Keywords
Ion irradiation; TiO2-x; Hydrogen ion
Citation
Journal of the Korean Physical Society, v.62, no.5, pp 781 - 786
Pages
6
Indexed
SCI
SCIE
SCOPUS
KCI
Journal Title
Journal of the Korean Physical Society
Volume
62
Number
5
Start Page
781
End Page
786
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/163300
DOI
10.3938/jkps.62.781
ISSN
0374-4884
1976-8524
Abstract
The effects of different irradiation doses of hydrogen ions on TiO2-x semiconductor films were investigated. The total doses were controlled between similar to 10(14) and similar to 10(15) atom/cm(2) at an acceleration energy of 110 keV. The Hall mobility was manipulated by changing the irradiation dose while the carrier concentration was not. The amorphous crystal structure was consistently maintained upon irradiation. The electronic structures of the molecular orbitals in the conduction band were modified, and the band edge states below the conduction band increased with increasing irradiation dose. These changes in electronic structure were correlated to the chemical bonding states and could lead to variations in the Hall mobility without a structural transformation.
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