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Fast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure
- Issue Date
- Jan-2013
- Publisher
- Korean Liquid Crystal Society, The Korean Information Display Society
- Citation
- The 15th Korea Liquid Crystal Conference (KLCC 2013), pp.47 - 49
- Indexed
- OTHER
- Journal Title
- The 15th Korea Liquid Crystal Conference (KLCC 2013)
- Start Page
- 47
- End Page
- 49
- Abstract
- We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one. As a result, we can achieve not only the fast rising time and but also falling time.
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Related Researcher
- Yu, Chang Jae
- COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)