Synthesis of silicon thin film by electrodeposition from ionic liquid
- Authors
- Park, Jesik; Park, Jaejun; Kwon, Kyungjung; Kim, Hansu; Lee, Churl Kyoung
- Issue Date
- Jan-2013
- Publisher
- Trans Tech Publications
- Keywords
- Nonaqueous electrolyte; Room-temperature electrolysis; Silicon; Thin film
- Citation
- Advanced Materials Research, v.650, pp.145 - 149
- Indexed
- SCOPUS
- Journal Title
- Advanced Materials Research
- Volume
- 650
- Start Page
- 145
- End Page
- 149
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/163750
- DOI
- 10.4028/www.scientific.net/AMR.650.145
- ISSN
- 1022-6680
- Abstract
- The synthesis of a silicon thin film by room-temperature electrodeposition was investigated in the ionic liquids 1-ethyl-3-methyl-imidazolium bis(trifluoromethylsulfonyl)imide ([EMIM]Tf2N) and 1-butyl-3-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide ([BMPy]Tf2N) with SiCl4. Cyclic voltammetry on a gold working electrode showed the possibility of the electrodeposition of elemental silicon. The reduction current of silicon in [EMIM]Tf2N was higher than in [BMPy]Tf2N. The elemental silicon thin film could be synthesized on the gold electrode under potentiostatic conditions, as confirmed by various analytical techniques including X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy with energy-dispersive spectroscopy. In the [EMIM]Tf2N electrolyte with dissolved SiCl4, the electrodeposited Si surface was more uniform than in [BMPy]Tf2N and no impurity was detected except trace oxygen caused by contamination during handling for analysis.
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