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Semiconducting behavior of niobium-doped titanium oxide in the amorphous state

Authors
Ok, Kyung-ChulPark, JosephLee, Ju HoAhn, Byung DuLee, Je HunChung, Kwun-BumPark, Jin-Seong
Issue Date
Apr-2012
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.100, no.14, pp.1 - 4
Indexed
SCIE
SCOPUS
Journal Title
APPLIED PHYSICS LETTERS
Volume
100
Number
14
Start Page
1
End Page
4
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/165838
DOI
10.1063/1.3698389
ISSN
0003-6951
Abstract
Electrical properties of Nb-doped titanium oxide films were evaluated with respect to annealing temperatures. Although an amorphous phase is preserved up to 450 degrees C, x-ray absorption spectroscopy analyses indicate that crystal field splitting in the conduction band begins to take place at this temperature. Such molecular orbital ordering effects induce a semiconducting behavior, which is manifested by working thin film transistor devices with field effect mobility values as high as 0.64 cm(2)/Vs. X-ray photoelectron spectroscopy studies disclose a drastic increase in Nb+5 states upon heat treatment, and these may be attributed to oxygen deficient states that generate free electrons.
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