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Thermal Evolution of Band Edge States in ZnO Film as a Function of Annealing Ambient Atmosphere

Authors
Park, Hyun-wooPark, Jin-SeongLee, Ju HoChung, Kwun-Bum
Issue Date
Feb-2012
Publisher
ELECTROCHEMICAL SOC INC
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, v.15, no.4, pp.H133 - H135
Indexed
SCIE
SCOPUS
Journal Title
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume
15
Number
4
Start Page
H133
End Page
H135
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/166268
DOI
10.1149/2.005205esl
ISSN
1099-0062
Abstract
RF-sputtered ZnO films were annealed under various annealing ambient atmospheres, including a vacuum, air, and water vapor. The physical and electrical properties of ZnO films annealed in various ambient atmospheres, were studied as a function of annealing temperature. The carrier concentration was dramatically increased, and the mobility was decreased when the films were annealed in a vacuum or water vapor. Even though the annealing ambient atmosphere and temperature were different, the preferred orientation and crystallization of the annealed ZnO films are maintained. However, two distinct band edge states below the conduction band, observed by spectroscopic ellipsometry measurement, undergo a thermal change as a function of annealing ambient atmosphere and these changes are correlated to changes in carrier concentration and mobility.
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