Electron energy flux control using dual power in side-type inductively coupled plasma
- Authors
- Bang, Jin-Young; Kim, Jin-Yong; Chung, Chin-Wook
- Issue Date
- Jul-2011
- Publisher
- American Institute of Physics
- Citation
- Physics of Plasmas, v.18, no.7, pp 1 - 5
- Pages
- 5
- Indexed
- SCI
SCIE
SCOPUS
- Journal Title
- Physics of Plasmas
- Volume
- 18
- Number
- 7
- Start Page
- 1
- End Page
- 5
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/168072
- DOI
- 10.1063/1.3609826
- ISSN
- 1070-664X
1089-7674
- Abstract
- Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.
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