Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates
- Authors
- Oh, Dohyun; No, Young Soo; Kim, Su Youn; Cho, Woon Jo; Kwack, Kae Dal; Kim, Tae Whan
- Issue Date
- Feb-2011
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Oxide materials; Thin films; Electronic properties; Optical properties; Atomic force microscopy; AFM; X-ray diffraction
- Citation
- JOURNAL OF ALLOYS AND COMPOUNDS, v.509, no.5, pp.2176 - 2179
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF ALLOYS AND COMPOUNDS
- Volume
- 509
- Number
- 5
- Start Page
- 2176
- End Page
- 2179
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/169130
- DOI
- 10.1016/j.jallcom.2010.10.180
- ISSN
- 0925-8388
- Abstract
- Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40 nm-CuAlO2/18 nm-Ag/40 nm-CuAlO2 multilayer films was 2.8 x 10(-5) Omega cm, and the transmittance of the multilayer films with an Ag film thickness of 8 nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells.
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