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Evaluation of cleaning procedure for the detection of scratches formed on oxide wafer during CMP process
- Authors
- 박진구
- Issue Date
- 24-Mar-2010
- Place
- Austin, Texas
- Conference Name
- SEMATECH Surface Preparation and Cleaning Conference
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Related Researcher
- Park, Jin Goo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)