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The effect of C(60) cluster ion beam bombardment in sputter depth profiling of organic-inorganic hybrid multiple thin films

Authors
Shon, Hyun KyongLee, Tae GeolKim, Dahl HyunKang, Hee JaeLee, Byoung HoonSung, Myung MoMoon, Dae Won
Issue Date
Dec-2008
Publisher
ELSEVIER SCIENCE BV
Keywords
ToF-SIMS; Inorganic-organic multiple nm thin films; C(60) cluster ion bombardment
Citation
APPLIED SURFACE SCIENCE, v.255, no.4, pp.1055 - 1057
Indexed
SCIE
SCOPUS
Journal Title
APPLIED SURFACE SCIENCE
Volume
255
Number
4
Start Page
1055
End Page
1057
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/171765
DOI
10.1016/j.apsusc.2008.05.157
ISSN
0169-4332
Abstract
The effects of C(60) cluster ion beam bombardment in sputter depth pro. ling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs(+), 10 keV C(60)(+), 20 keV C(60)(2+) and 30 keV C(60)(3+) was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
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