The effect of C(60) cluster ion beam bombardment in sputter depth profiling of organic-inorganic hybrid multiple thin films
- Authors
- Shon, Hyun Kyong; Lee, Tae Geol; Kim, Dahl Hyun; Kang, Hee Jae; Lee, Byoung Hoon; Sung, Myung Mo; Moon, Dae Won
- Issue Date
- Dec-2008
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- ToF-SIMS; Inorganic-organic multiple nm thin films; C(60) cluster ion bombardment
- Citation
- APPLIED SURFACE SCIENCE, v.255, no.4, pp.1055 - 1057
- Indexed
- SCIE
SCOPUS
- Journal Title
- APPLIED SURFACE SCIENCE
- Volume
- 255
- Number
- 4
- Start Page
- 1055
- End Page
- 1057
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/171765
- DOI
- 10.1016/j.apsusc.2008.05.157
- ISSN
- 0169-4332
- Abstract
- The effects of C(60) cluster ion beam bombardment in sputter depth pro. ling of inorganic-organic hybrid multiple nm thin films were studied. The dependence of SIMS depth profiles on sputter ion species such as 500 eV Cs(+), 10 keV C(60)(+), 20 keV C(60)(2+) and 30 keV C(60)(3+) was investigated to study the effect of cluster ion bombardment on depth resolution, sputtering yield, damage accumulation, and sampling depth.
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