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CMOS symmetric trace differential stacked spiral inductor

Authors
Kim, J.Kim, H.
Issue Date
Jul-2010
Publisher
INST ENGINEERING TECHNOLOGY-IET
Citation
ELECTRONICS LETTERS, v.46, no.14, pp.1005 - U70
Indexed
SCIE
SCOPUS
Journal Title
ELECTRONICS LETTERS
Volume
46
Number
14
Start Page
1005
End Page
U70
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/174510
DOI
10.1049/el.2010.1234
ISSN
0013-5194
Abstract
A miniature silicon-based symmetric trace differential stacked spiral inductor (SDSSI) has been implemented using standard 0.18 mu m CMOS technology. Based on the measured two-port S-parameter using a standard de-embedding procedure, the self-resonance frequency (f(sr)) and quality factor (Q) of the SDSSI were compared to a conventional differential stacked spiral inductor (DSSI). The f(sr) of the SDSSI was nearly 2.5 times higher than that of the DSSI, and the Q value of the SDSSI was also enhanced.
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COLLEGE OF ENGINEERING (SCHOOL OF ELECTRONIC ENGINEERING)
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