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Coupling Top- and Bottom-Gate ZnO Thin Film Transistors for Low Voltage, High Gain Inverter

Authors
Oh, Min SukHan, Jeong InLee, KimoonLee, Byoung H.Sung, Myung M.Im, Seongil
Issue Date
Mar-2010
Publisher
ELECTROCHEMICAL SOC INC
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, v.13, no.6, pp.II194 - II196
Indexed
SCIE
SCOPUS
Journal Title
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume
13
Number
6
Start Page
II194
End Page
II196
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/175318
DOI
10.1149/1.3373521
ISSN
1099-0062
Abstract
We reported on the fabrication of depletion-load-type ZnO thin film transistor (TFT) inverters coupling top-and bottom-gate TFTs that have 20 nm thin Al2O3 dielectrics grown by atomic layer deposition. Because the top-gate ZnO TFT showed a lower field-effect mobility of 0.1 cm(2)/V s than that of the bottom-gate device (2.4 cm(2)/V s), we used the top-and bottom-gate structures as driver and load transistors, respectively, to adjust the transition voltage of the inverter with an identical width/length dimension for both TFTs. Our ZnO inverter demonstrated an excellent voltage gain of similar to 41 at a low supply voltage of 5 V.
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