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Langmuir Probe Perturbation in Inductively Coupled Plasmas

Authors
Jang, Sung-HoLee, Min-HyongChung, Chin-Wook
Issue Date
Nov-2009
Publisher
한국물리학회
Keywords
Langmuir probe perturbation; Plasma uniformity; Plasma perturbation
Citation
Journal of the Korean Physical Society, v.55, no.5, pp 1869 - 1872
Pages
4
Indexed
SCIE
SCOPUS
KCI
Journal Title
Journal of the Korean Physical Society
Volume
55
Number
5
Start Page
1869
End Page
1872
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/175927
DOI
10.3938/jkps.55.1869
ISSN
0374-4884
1976-8524
Abstract
For radial plasma density profile measurements, Langmuir probes are usually used. In this paper, a Langmuir probe was located at 4 cm below a dielectric window and the measurement was performed at 25 mTorr of argon at various rf powers (13.56 MHz). We found that the radial plasma density distributions became asymmetric as the rf power increases. To investigate the cause of this asymmetric density distribution, we installed a floating probe that can measure plasma densities and the electron temperatures in real time on the chamber wall. At high rf powers, as the probe body went in, the plasma density measured by the floating probe decreased. This indicates that the entire plasma density is affected by the probe intrusion. It appears that the Langmuir probe passes through the skin layer and the probe body impedes the electron heating process in the skin layer. As a solution, a probe body shape to avoid this perturbation is presented.
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