Current Flow Mechanisms of Platinum-Silicided p-Type Schottky Barrier MOSFETs
- Authors
- Jang, Moongyu; Lee, Seongjae
- Issue Date
- Oct-2008
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Schottky barrier; MOSFET; Tunneling; Mechanism
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.53, no.4, pp.2175 - 2178
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 53
- Number
- 4
- Start Page
- 2175
- End Page
- 2178
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/177835
- DOI
- 10.3938/jkps.53.2175
- ISSN
- 0374-4884
- Abstract
- The current flow mechanisms of platinum-silicided p-type Schottky barrier metal-oxide-semiconductor field-effect-transistors (SB-MOSFETs) are analyzed by incorporating experimental results with an analytical model. In our analysis, we find that the off-current is mainly attributed to the thermionic current component whereas the on-current is due to the tunneling current. Since the tunneling current component rapidly increases at voltage above the threshold voltage, a lower Schottky barrier height and a thinner gate oxide are essential features to achieve a higher drive current in SB-MOSFETs.
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