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Small molecular organic nonvolatile memory fabricated with Ni nanocrystals embedded in Alq3

Authors
Oh, Young HwanNam, Woo SikLee, Gon SubPark, Jea GunLee, Yong Bok
Issue Date
Jul-2008
Publisher
Materials Research Society
Citation
Materials Research Society Symposium Proceedings, v.1071, pp.135 - 140
Indexed
SCOPUS
Journal Title
Materials Research Society Symposium Proceedings
Volume
1071
Start Page
135
End Page
140
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/178145
DOI
10.1557/proc-1071-f05-12
ISSN
0272-9172
Abstract
Recently, organic nonvolatile memory has attracted much interest as a candidate device for next generation nonvolatile memory because of its simple process, small device area, and high speed. To investigate electrical characteristics of small molecular organic nonvolatile memory with Ni as a middle metal layer, we developed a small molecular organic nonvolatile memory with the device structure of Aluminum tris (8-hydroxyquinolate) (Al/Alq 3), Ni nanocrystals, and Alq3/Al. A high vacuum thermal deposition method was used for the device fabrication. It is critical that the fabrication process condition for Ni nanocrystals be optimized, including ̃100 Å thickness, 0.1 Å/sec-evaporation rate, and in-situ plasma oxidation for effective oxidation. The reasons we chose Ni for the middle metal layer are that Ni has a smaller grain boundary, which is beneficial for scaling down and has a larger work function (-5.15 eV) that can make a deep quantum well in an energy band diagram, compared with that of Al. Our device showed an electrical nonvolatile memory behavior including Vth, of -2 V, Vw (write) of -3.5 V, negative differential region (NDR) of 3.5-7 V, Ve (erase) of 8 V, and symmetrical electrical behavior at reverse bias. In addition, an interesting behavior of electrical properties was that, although retention and endurance characteristics were similar to the Al device, the Ion/Ioff ratio was greater than 104 at Vr (read) of 1 V. This value of the Ni device was higher than 10 2 compared to that of the Al device. Also, small molecular organic nonvolatile memory with a Ni middle layer with α-NPD at same fabrication condition showed more unstable characteristics than Alq3. We can speculate that there is a relationship in fabrication condition between the middle metal material and the organic material. Finally, we conclude that our device with a Ni nanocrystals middle layer is more reliable and useful for small molecular organic nonvolatile memory.
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