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Design of pattern-specific mask grating for giving the effect of an off-axis illumination
- Authors
- Kim, Young-Seok; Song, Seok Ho; Lee, Jong Ung; Oh, Sung Hyun; Choi, Yong Kyoo; Kim, Munsik; Rajiv, Beom-Hoan; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol
- Issue Date
- May-2008
- Publisher
- SPIE
- Keywords
- Dummy mask; Mask grating; Off-axis illumination; Optical lithography; Resolution enhancement
- Citation
- Proceedings of SPIE - The International Society for Optical Engineering, v.6792, pp.1 - 10
- Indexed
- SCOPUS
- Volume
- 6792
- Start Page
- 1
- End Page
- 10
- ISSN
- 0277-786X
- Abstract
- In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves.
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Related Researcher
- Song, Seok Ho
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)