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Analysis of temperature-dependent barrier heights in erbium-silicided Schottky diodes

Authors
Jun, MyungsimJang, MoongyuKim, YarkeonChoi, CheljongKim, TaeyoubOh, SoonyoungLee, Seongjae
Issue Date
Jan-2008
Publisher
American Institute of Physics
Citation
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.26, no.1, pp 137 - 140
Pages
4
Indexed
SCIE
SCOPUS
Journal Title
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume
26
Number
1
Start Page
137
End Page
140
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/179085
DOI
10.1116/1.2825172
ISSN
1071-1023
2166-2746
Abstract
We manufactured erbium-silicided Schottky diodes on n-type and p-type silicon substrates to determine the Schottky barrier heights for electrons and holes, respectively. The effective barrier heights were extracted from the current-voltage-temperature characteristics of the Schottky diodes in reverse-bias condition. The barrier heights were obtained as a function of temperature, decreasing with the decrease of temperature. Low effective barrier heights at low temperature may be due to the trap-assisted current at the erbium silicide/silicon Schottky junction. The temperature-independent barrier heights for electrons and holes were evaluated to be 0.39 and 0.69 eV, respectively, at high temperature by fitting the effective barrier heights as a function of temperature. In this case, the carrier conduction mechanism can be explained by the pure thermionic emission model.
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