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An incremental floorplanning algorithm for temperature reduction

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dc.contributor.authorKim, Won Jin-
dc.contributor.authorChung, Ki Seok-
dc.date.accessioned2022-12-21T06:23:32Z-
dc.date.available2022-12-21T06:23:32Z-
dc.date.created2022-09-16-
dc.date.issued2007-09-
dc.identifier.issn0000-0000-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/179571-
dc.description.abstractIntegrating a large number of transistors in a limited silicon area causes chip temperature to increase rapidly. High temperature incurs a number of design problems such as high leakage power consumption and unreliable operations. It is worthwhile to note that the peak temperature of a chip may go down by finding an optimal floorplanning. Especially, it is very important to consider temporal correlation of temperature states because the temperature of a block may go up or down depending on the temperatures of the surrounding blocks. In this paper, we propose a set of floorplanning techniques to reduce the peak temperature.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-
dc.titleAn incremental floorplanning algorithm for temperature reduction-
dc.typeArticle-
dc.contributor.affiliatedAuthorChung, Ki Seok-
dc.identifier.doi10.1109/SOCC.2007.4545428-
dc.identifier.scopusid2-s2.0-51049119195-
dc.identifier.bibliographicCitationProceedings - 20th Anniversary IEEE International SOC Conference, pp.67 - 70-
dc.relation.isPartOfProceedings - 20th Anniversary IEEE International SOC Conference-
dc.citation.titleProceedings - 20th Anniversary IEEE International SOC Conference-
dc.citation.startPage67-
dc.citation.endPage70-
dc.type.rimsART-
dc.type.docTypeConference Paper-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusCMOS integrated circuits-
dc.subject.keywordPlusSilicon-
dc.subject.keywordPlusFloor-planning-
dc.subject.keywordPlusPeak temperatures-
dc.subject.keywordPlusHigh temperature operations-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/4545428-
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