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Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography
- Authors
- Kim, Young-Seok; Song, Seok Ho; Oh, Sung Hyun; Choi, Yong Kyu; O, Beom Hoan; Park, Se Geun; Lee, El Hang; Lee, Seung Gol
- Issue Date
- Aug-2007
- Publisher
- IEEE
- Citation
- Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, pp.1 - 2
- Indexed
- SCOPUS
- Journal Title
- Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
- Start Page
- 1
- End Page
- 2
- ISSN
- 0000-0000
- Abstract
- We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.
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Related Researcher
- Song, Seok Ho
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)