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Emission from carbon nanotubes etched by a dc plasma

Authors
Cho, Hyun JinLee, NaesungJang, IngooUh, Hyung SooHong, Jin Pyo
Issue Date
Jun-2007
Publisher
KOREAN PHYSICAL SOC
Keywords
carbon nanotubes; NH3; thermal CVD; annealing; growth; field emission; dc plasma etching; tape activation
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.50, no.6, pp.1848 - 1853
Indexed
SCIE
SCOPUS
KCI
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
50
Number
6
Start Page
1848
End Page
1853
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180040
DOI
10.3938/jkps.50.1848
ISSN
0374-4884
Abstract
This study investigates the effect of NH3 gas upon the growth of carbon nanotubes (CNTs) using thermal chemical vapor deposition. It is considered that the CNT synthesis is thought to occur mainly through two steps, clustering of catalyst particles followed by growth of CNTs. We, thus, introduced NH3 during either an annealing or growth step. When NH3 was fed only during annealing, CNTs grew longer and were more highly crystalline with their diameters unchanged. Addition of NH3 during growth, however, resulted in shorter CNTs with lower crystallinity and increased diameters. Vertically aligned, highly populated CNT samples showed poor field emission characteristics, leading us to apply post-treatment onto the CNT surface. The CNTs were etched back by dc plasma of N-2 to reduce the population density and the radius of curvatures of CNTs, which resulted in a considerable improvement of the field emission characteristics.
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