Effects of in situ thermal annealing on the structural, optical, and electrical properties in Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers
- Authors
- Ryu, Yeung-Shik; Kang, Tae Won; Kim, Taewhan
- Issue Date
- Dec-2006
- Publisher
- Elsevier BV
- Keywords
- thermal annealing effect; molecular beam epitaxy; optical properties; semiconductors; surface morphology
- Citation
- Applied Surface Science, v.253, no.5, pp 2652 - 2656
- Pages
- 5
- Indexed
- SCIE
SCOPUS
- Journal Title
- Applied Surface Science
- Volume
- 253
- Number
- 5
- Start Page
- 2652
- End Page
- 2656
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/180728
- DOI
- 10.1016/j.apsusc.2006.05.028
- ISSN
- 0169-4332
1873-5584
- Abstract
- Scanning electron microscopy (SEM), Fourier transform infrared (FTIR) transmission, and Hall effect measurements were performed to investigate the structural, optical, and electrical properties of as-grown and in situ-annealed Hg0.7Cd0.3Te epilayers grown on CdTe buffer layers by using molecular beam epitaxy. After the Hg0.7Cd0.3Te epilayers had been annealed in a Hg-cell flux atmosphere, the SEM images showed that the surface morphologies of the Hg0.7Cd0.3Te thin films were mirror-like with no indication of pinholes or defects, and the FTIR spectra showed that the transmission intensities had increased in comparison to that of the as-grown Hg0.7Cd0.3Te epilayer. Hall-effect measurements showed that n-Hg0.7Cd0.3Te epilayers were converted to p-Hg0.7Cd0.3Te epilayers. These results indicate that the surface, optical, and electrical proper-ties of the Hg1-xCdxTe epilayers are improved by annealing and that as-grown n-Hg1-xCdxTe epilayers can be converted to p-Hg1-xCdxTe epilayers by in situ annealing. (c) 2006 Elsevier B.V. All rights reserved.
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