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The incident angle effect of al adatom on the growth morphology of Al/Ni(001) system: Molecular dynamics simulation
- Authors
- Lee, Soon-gun; Chung, Yong Chae
- Issue Date
- May-2006
- Publisher
- IEEE
- Citation
- INTERMAG 2006 - IEEE International Magnetics Conference, pp.167 - 167
- Indexed
- SCOPUS
- Journal Title
- INTERMAG 2006 - IEEE International Magnetics Conference
- Start Page
- 167
- End Page
- 167
- ISSN
- 0000-0000
- Abstract
- The deposition behavior of Al atoms on Ni(001) substrate for various adatom incident angle and incident energy is investigated in this study using molecular dynamics simulation to investigate the growth morphology and the quality of thin film in atomic level. Results show that the surface roughness is comparatively decreased irrespective of adatom incident angle at the incident energy of 6 eV.
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Collections - 서울 공과대학 > 서울 신소재공학부 > 1. Journal Articles
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Related Researcher
- Chung, Yong Chae
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)