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HfO2 Films having wide ALD window using a Novel Heteroleptic Hf Precursor by Plasma-Enhanced Atomic Layer Deposition
- Authors
- 박진성
- Issue Date
- 24-Jan-2022
- Publisher
- 한국반도체산업협회/연구조합
- Citation
- 제 29회 한국반도체학술대회
- Conference Name
- 제 29회 한국반도체학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)