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Structural and Electrical characteristics of Low-k Silicon Oxycarbide thin film deposited via Remote Plasma Atomic Layer Deposition
- Authors
- 전형탁
- Issue Date
- 17-May-2019
- Place
- 평창 알펜시아 리조트
- Conference Name
- 2019년도 한국재료학회 춘계학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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