Soret-Effect Induced Phase-Change in a Chromium Nitride Semiconductor Film
- Authors
- Shuang, Yi; Mori, Shunsuke; Yamamoto, Takuya; Hatayama, Shogo; Saito, Yuta; Fons, Paul J.; Song, Yun-Heub; Hong, Jin-Pyo; Ando, Daisuke; Sutou, Yuji
- Issue Date
- Aug-2024
- Publisher
- American Chemical Society
- Keywords
- nitride; melting-free; soret-effect; phase-change materials; nonvolatile memory
- Citation
- ACS Nano, v.18, no.32, pp 21135 - 21143
- Pages
- 9
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS Nano
- Volume
- 18
- Number
- 32
- Start Page
- 21135
- End Page
- 21143
- URI
- https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/195091
- DOI
- 10.1021/acsnano.4c03574
- ISSN
- 1936-0851
1936-086X
- Abstract
- Phase-change materials such as Ge-Sb-Te (GST) exhibiting amorphous and crystalline phases can be used for phase-change random-access memory (PCRAM). GST-based PCRAM has been applied as a storage-class memory; however, its relatively low ON/OFF ratio and the large Joule heating energy required for the RESET process (amorphization) significantly limit the storage density. This study proposes a phase-change nitride, CrN, with a much wider programming window (ON/OFF ratio more than 10(5)) and lower RESET energy (one order of magnitude reduction from GST). High-resolution transmission electron microscopy revealed a phase-change from the low-resistance cubic CrN phase into the highly resistive hexagonal CrN2 phase induced by the Soret-effect. The proposed phase-change nitride could greatly expand the scope of conventional phase-change chalcogenides and offer a strategy for the next-generation of PCRAM, enabling a large ON/OFF ratio (similar to 10(5)), low switching energy (similar to 100 pJ), and fast operation (similar to 30 ns).
Phase-change materials such as Ge−Sb−Te (GST) exhibiting amorphous and crystalline phases can be used for phase-change random-access
memory (PCRAM). GST-based PCRAM has been applied as a storage-class memory; however, its relatively low ON/OFF ratio and the large Joule heating energy required for the RESET process (amorphization) significantly limit the storage density. This study proposes a phase-change nitride, CrN, with a much wider programming window (ON/OFF ratio more than 105) and lower RESET energy (one order of magnitude
reduction from GST). High-resolution transmission electron microscopy revealed a phase-change from the low-resistance cubic CrN phase into the highly resistive hexagonal CrN2 phase induced by the Soret-effect. The proposed phase-change nitride could greatly expand the scope of conventional phase-change chalcogenides and offer a strategy for the next-generation of PCRAM, enabling a large ON/OFF ratio (∼105), low switching energy (∼100 pJ), and fast operation (∼30 ns).
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