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Thermal analysis of implanter source head in radio-frequency inductively coupled plasma

Authors
Jeong, Chang-WonRyu, Choong-MoLee, Hee-LakHwang, Jong JinMoon, Seung Jae
Issue Date
Mar-2024
Publisher
American Institute of Physics
Citation
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.42, no.2, pp 1 - 10
Pages
10
Indexed
SCIE
SCOPUS
Journal Title
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume
42
Number
2
Start Page
1
End Page
10
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/196039
DOI
10.1116/6.0003060
ISSN
1071-1023
2166-2746
Abstract
The inductively coupled plasma-ion implanter is a closed vacuum, and the temperature increase in the source head owing to plasma generation in the chamber was predicted by numerical simulation and verified via measurements. The heat generation of the source head inside the vacuum chamber was photographed using an infrared thermal-imaging camera and set as the main temperature boundary condition for analysis. The showerhead temperature was confirmed through thermocouple measurements to verify the simulation and ensure reliability. An error of less than 1% was obtained for the aperture and aperture cover. The simulation-analysis results and measured showerhead results obtained from the thermocouple equipment exhibited an error of less than 2%.
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