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Electrical Characteristics of FeFET with Atomic Layer Deposited HZO Thin Film and IGO Channel for Flash Memory Application
- Authors
- 최창환
- Issue Date
- 20-Sep-2023
- Place
- University of Technology (Warsaw, Poland)
- Conference Name
- European Materials Research Society (E-MRS) Fall Meeting
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)