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Area-selective-deposition (ASD) of Ruthenium (Ru) Thin Film Using Self-assembled Monolayer (SAM) through Surface Modification
- Authors
- 최창환
- Issue Date
- 25-Jan-2024
- Place
- 경주화백컨벤션센터
- Conference Name
- 31회 한국반도체학술대회 (KCS)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)