Investigation of the interactions of NF3-based plasma with Y2O3 and YF3 coatings: Focus on contamination particle generation and wall redeposition

Abstract

This study investigates the interactions of Y2O3 and YF3 atmospheric plasma spraying (APS) coatings with NF3/ Ar/O2 plasma, focusing on their positions on chamber electrodes and walls. The electrode coatings showed mass loss due to ion bombardment, with YF3 experiencing more loss than Y2O3. Coatings on the walls gained mass from byproduct redeposition, with Y2O3 showing greater mass increase than YF3 due to its higher fluorine reactivity, which enhanced F radical absorption and promoted redeposition. Scanning electron microscopy, energy dispersive X-ray spectroscopy, and X-ray photoelectron spectroscopy revealed that fine particles on the coatings either agglomerated or were removed, with agglomerated particles exhibiting high fluorine intensity. The results emphasize the importance of selecting the appropriate material based on its position in the chamber, as this significantly affects contamination and redeposition behaviors. These findings are crucial for optimizing material selection in plasma applications, improving process stability and equipment lifespan.