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Mitigating best focus shift in high-NA EUV lithography via optical constant screening
- Authors
- 안진호
- Issue Date
- 22-Sep-2025
- Place
- 미국
- Conference Name
- 2025 SPIE Photomask Technology + EUV Lithography
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)